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MOSFET Threshold Voltage Calculator — V_th from Device Parameters

Compute the long-channel MOSFET threshold voltage V_th from fundamental device parameters: substrate doping N_A, gate oxide thickness t_ox and flat-band voltage V_fb. The step-by-step breakdown shows the Fermi potential, oxide capacitance and depletion charge contributions.
e.g. 17 means N_A = 10¹⁷ cm⁻³ (typical: 16–18)

nm

SiO₂ gate dielectric thickness

V

Typically −0.9 V for n⁺ poly gate on p-Si; adjust for your process
Threshold voltage V_th
0.3879V

Gate voltage at which the inversion channel forms (long-channel, 300 K)

Fermi potential φ_F
0.4062 V
Surface potential 2φ_F
0.8123 V
Oxide cap. C_ox
3.453e-7 F/cm²
Body-effect term Q_dep/C_ox
0.4755 V
Step-by-step threshold voltage derivation
1

Fermi potential φ_F

φ_F = (kT/q) × ln(N_A / n_i) = 0.02585 × ln(10^17.0 / 1.5×10^10) = 0.4062 V
2

Oxide capacitance C_ox

C_ox = ε_ox / t_ox = (3.9 × 8.854×10⁻¹⁴) / (10 nm) = 3.453e-7 F/cm²
3

Max depletion charge |Q_dep|

Q_dep = √(2 ε_Si q N_A 2φ_F) = √(2 × 1.036e-12 × 1.602e-19 × 1.000e+17 × 0.8123) = 1.642e-7 C/cm²
=

Threshold voltage V_th

V_th = V_fb + 2φ_F + Q_dep/C_ox = -0.9 + 0.8123 + 0.4755 = 0.3879 V
-1-0.6-0.30.10.50.91.31.62V_th = 0.3879 VThreshold voltage on a typical NMOS range (V)
Step by step
  1. 1

    Fermi potential φ_F

    (kT/q) × ln(N_A ÷ n_i) = 0.02585 × ln(10^17 ÷ 1.5×10¹⁰) = 0.4062
  2. 2

    Oxide capacitance C_ox

    ε_ox ÷ t_ox = 3.9 × 8.854×10⁻¹⁴ ÷ (10 × 10⁻⁷ cm) = 0
    Gate oxide capacitance per unit area (F/cm²).
  3. 3

    Depletion charge |Q_dep|

    √(2 × ε_Si × q × N_A × 2φ_F) = 0
  4. 4

    Threshold voltage V_th

    V_fb + 2φ_F + Q_dep ÷ C_ox = -0.9 + 0.8123 + 0.4755 = 0.3879
Results are estimates for general information only and are not professional advice — always verify important results independently before relying on them. Read the full disclaimer.
Quick answer

How does this calculator work?

MOSFET threshold voltage: V_th = V_fb + 2φ_F + Q_dep/C_ox. Fermi potential φ_F = 25.85 mV × ln(N_A / 1.5×10¹⁰). Oxide cap C_ox = 3.9ε₀/t_ox. Depletion charge Q_dep = √(2×11.7ε₀×q×N_A×2φ_F). Valid for long-channel, uniformly doped p-substrate at 300 K.

Formula
V_th = V_fb + 2φ_F + |Q_dep|/C_ox where φ_F = (kT/q)ln(N_A/n_i), C_ox = ε_ox/t_ox, Q_dep = √(2ε_Si·q·N_A·2φ_F)
How this is calculated

The threshold voltage marks the gate bias at which a strong inversion layer (the channel) forms at the silicon surface. It has three additive components. The flat-band voltage V_fb accounts for the work-function difference between the gate material and the silicon, plus any fixed oxide charge — it is typically around −0.9 V for an n⁺ polysilicon gate on p-type silicon.

The surface potential term 2φ_F is twice the Fermi potential, the energy level that separates filled from empty electron states in the bulk. φ_F = (kT/q) × ln(N_A / n_i), where n_i ≈ 1.5×10¹⁰ cm⁻³ for silicon at 300 K. The body-effect term Q_dep/C_ox is the voltage required to sweep the depletion charge out of the channel region: Q_dep = √(2ε_Si·q·N_A·2φ_F) is the maximum depletion charge, and C_ox = ε_ox/t_ox is the gate-oxide capacitance per unit area.

This formula assumes a long-channel, uniformly doped p-substrate at 300 K. Short-channel effects (threshold roll-off, drain-induced barrier lowering), non-uniform retrograde doping, polysilicon depletion and high-κ dielectrics all modify the result. The constants used are: n_i = 1.5×10¹⁰ cm⁻³, ε_Si = 11.7ε₀, ε_SiO₂ = 3.9ε₀, q = 1.602×10⁻¹⁹ C, kT/q = 25.85 mV.

Frequently asked questions

V_fb is the gate voltage at which there is no band bending at the silicon surface — the semiconductor is electrically flat. It depends on the gate-to-silicon work-function difference and fixed oxide charge. For an n⁺ polysilicon gate on p-type silicon, V_fb ≈ −0.9 V is a common starting estimate; for metal gates it varies widely by metal species.

Higher substrate doping N_A raises both φ_F and |Q_dep|, increasing V_th. This is the basis of threshold-voltage adjustment implants: ion-implanting the channel with acceptors raises V_th; donor implants lower it. The dependence is roughly logarithmic in N_A for φ_F and as √N_A for the body-effect term.

The body effect describes how V_th increases when a reverse bias V_SB is applied between the source and the body. The modified formula is V_th(V_SB) = V_th0 + γ(√(2φ_F + V_SB) − √(2φ_F)), where γ = √(2ε_Si·q·N_A) / C_ox is the body-effect coefficient. This calculator computes V_th0 (V_SB = 0).

Also known as

mosfet threshold voltage vth
semiconductor threshold voltage calculator
flat band voltage mosfet
fermi potential silicon
oxide capacitance cox calculator
mosfet turn on voltage
depletion charge threshold voltage

APA

TG we-Calculate Editorial Team. (2026). MOSFET Threshold Voltage Calculator — V_th from Device Parameters [Online calculator]. TG we-Calculate. https://we-calculate.com/calculator/mosfet-threshold-voltage-calculator

Chicago

TG we-Calculate Editorial Team. "MOSFET Threshold Voltage Calculator — V_th from Device Parameters." TG we-Calculate. 2026. https://we-calculate.com/calculator/mosfet-threshold-voltage-calculator.

IEEE

TG we-Calculate Editorial Team, "MOSFET Threshold Voltage Calculator — V_th from Device Parameters," TG we-Calculate, 2026. [Online]. Available: https://we-calculate.com/calculator/mosfet-threshold-voltage-calculator

BibTeX

@misc{wecalculate_mosfet_threshold_voltage_calculator, title = {MOSFET Threshold Voltage Calculator — V_th from Device Parameters}, author = {{TG we-Calculate Editorial Team}}, howpublished = {\url{https://we-calculate.com/calculator/mosfet-threshold-voltage-calculator}}, year = {2026}, note = {TG we-Calculate} }

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